Furnace Equipment
Several furnaces covering a variety of temperature ranges under vacuum or various ambient conditions are available to carry out diffusion processes, dopant activation, ion-implantation damage repair, fabrication of graphene or carbon nanotubes, etc.
Furnace Equipment
| Equipment Name | Contact | Location | |
|---|---|---|---|
| Equipment Name | Contact | Location | |
| Graphene Furnace - Max Temp. 1000°C |
|
322 MRL |
The Graphene Furnace is solely dedicated to the growth of high-quality graphene and carbon nanotube materials.
|
| Hydrogen Vacuum Furnace – Max Temp. 1000°C |
|
322 MRL |
The Hydrogen Vacuum Furnace is dedicated to annealing of materials under hydrogen and vacuum environment. |
| Rapid Thermal Annealing furnace (Custom) – max temperature 1000°C |
|
328 MRL |
Rapid Thermal Annealing furnace (Custom) – max temperature 1000°C |
| High Temperature CM furnace – max temperature 1600°C to 1700°C |
|
328 MRL |
High Temperature CM furnace – max temperature 1600°C (long runs) to 1700°C (short runs) |
| Reactor Vacuum Furnace (RVF) |
|
322 MRL |
Reactor Vacuum Furnace - 1” tube furnace for recording pressure, temperature, vacuum, and reaction products at up to 1200°C |
| Tube furnace - 6 inch |
|
328 MRL |
6" Tube oxidation furnace – max temperature 1100°C |
| Lindberg 3 Zone Furnace-2 inch |
|
328 MRL |
Lindberg Three Zone 2 Inch - Tube oxidation/annealing furnace – max temperature 1100°C |